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CeO2 coated YSZ Substrate can be used as substrates in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging, as well as cell culture, protein DNA microarrays, and reflectometers. The silicon wafer of this product is generally plated with a layer of CeO2 with a thickness of 40nm on one side.
|
Epitaxial thin Film Composition |
CeO2 |
|
Epitaxial Film Thickness |
40 nm ± 10 nm |
|
Epitaxial FWHM |
< 5 o |
|
Substrate |
<110>, YSZ, 10x10x0.5 mm |
|
Surface finish |
One side polished |
|
Orientation |
<110> |
Widely used as substrates in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging, as well as cell culture, protein DNA microarrays, and reflectometers.
Our CeO2 coated YSZ Substrate is carefully handled during storage and transportation to preserve the quality of our product in its original condition.
Packing: in 1000 class clean room with plastic bag
